Method of forming low resistivity fluorine free tungsten film without nucleation

ABSTRACT

Provided herein are methods of depositing fluorine-free tungsten by sequential CVD pulses, such as by alternately pulsing a chlorine-containing tungsten precursor and hydrogen in cycles of temporally separated pulses, without depositing a tungsten nucleation layer. Methods also include depositing tungsten directly on a substrate surface using alternating pulses of a chlorine-containing tungsten precursor and hydrogen without treating the substrate surface.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation-in-part of U.S. patent applicationSer. No. 14/723,270, filed May 27, 2015, and titled “DEPOSITION OF LOWFLUORINE TUNGSTEN BY SEQUENTIAL CVD PROCESS,” which is incorporated byreference herein in its entirety and for all purposes.

BACKGROUND

Deposition of tungsten-containing materials is an integral part of manysemiconductor fabrication processes. These materials may be used forhorizontal interconnects, vias between adjacent metal layers, contactsbetween metal layers and devices on the silicon substrate, and highaspect ratio features. In a conventional tungsten deposition process ona semiconductor substrate, the substrate is heated to the processtemperature in a vacuum chamber, and a very thin portion of tungstenfilm which serves as a seed or nucleation layer is deposited.Thereafter, the remainder of the tungsten film (the bulk layer) isdeposited on the nucleation layer by exposing the substrate to tworeactants simultaneously. The bulk layer is generally deposited morerapidly than the nucleation layer. However, as devices shrink and morecomplex patterning schemes are utilized in the industry, deposition ofthin tungsten films becomes a challenge.

SUMMARY

Provided herein are methods and apparatuses for processing substrates.One aspect involves a method of filling a feature including: (a)providing a substrate in a chamber, the substrate including the featurehaving an untreated surface; and (b) without treating the untreatedsurface of the feature and without depositing a tungsten nucleationlayer in the feature, exposing the untreated surface to cycles ofalternating pulses of hydrogen and a chlorine-containing tungstenprecursor introduced to the chamber to deposit bulk tungsten directly onthe untreated surface.

In various embodiments, the chlorine-containing tungsten precursor istungsten hexachloride. In various embodiments, the chlorine-containingtungsten precursor is tungsten pentachloride.

A pulse of the chlorine-containing tungsten precursor may includebetween about 0.1% and about 1.5% of chlorine-containing tungstenprecursor by volume.

In various embodiments, the chamber is purged between each pulse of thehydrogen and the chlorine-containing tungsten precursor.

Another aspect involves a method of filling a feature including: (a)providing a substrate in a chamber, the substrate including the feature;and (b) exposing the substrate to cycles of alternating pulses ofhydrogen and a chlorine-containing tungsten precursor introduced to thechamber to deposit bulk tungsten directly in the feature, whereby thechamber pressure is no more than 10 Torr.

The method may also include (c) prior to exposing the substrate to thealternating pulses of the hydrogen and the chlorine-containing tungstenprecursor, exposing the substrate to a reducing agent for a soaktreatment.

The method may also include (c) prior to exposing the substrate to thealternating pulses of the hydrogen and the chlorine-containing tungstenprecursor, exposing the substrate to alternating pulses of a reducingagent and the chlorine-containing tungsten precursor to deposit atungsten nucleation layer on the substrate.

In some embodiments, each cycle forms a submonolayer of the bulktungsten having a thickness of at least about 0.3 Å.

In various embodiments, the chlorine-containing tungsten precursor istungsten hexachloride. In various embodiments, the chlorine-containingtungsten precursor is tungsten pentachloride.

In some embodiments, the bulk tungsten is deposited at a substratetemperature between about 400° C. and about 600° C.

In various embodiments, the chamber is purged between each pulse of thehydrogen and the chlorine-containing tungsten precursor. Each purge maybe performed for a duration between about 0.25 seconds and about 30seconds.

In various embodiments, a pulse of the chlorine-containing tungstenprecursor comprises between about 0.1% and about 1.5% ofchlorine-containing tungsten precursor by volume.

Another aspect involves a method of filling a feature including: (a)providing a substrate in a chamber, the substrate including the feature;(b) exposing the substrate to cycles of alternating pulses of hydrogenand a chlorine-containing tungsten precursor introduced to the chamberto deposit bulk tungsten in the feature without depositing a tungstennucleation layer; and (c) prior to exposing the substrate to thealternating pulses of the hydrogen and the chlorine-containing tungstenprecursor, exposing the substrate to a reducing agent for a soaktreatment.

In various embodiments, a pulse of the chlorine-containing tungstenprecursor comprises between about 0.1% and about 1.5% ofchlorine-containing tungsten precursor by volume.

In various embodiments, the bulk tungsten is deposited at a substratetemperature between about 400° C. and about 600° C.

In some embodiments, the chamber is purged between each pulse of thereducing agent and the chlorine-containing tungsten precursor. In someembodiments, each purge is performed for a duration between about 0.25seconds and about 30 seconds.

Another aspect involves an apparatus for processing substrates, theapparatus including: (a) at least one process chamber including apedestal configured to hold a substrate; (b) at least one outlet forcoupling to a vacuum; (c) one or more process gas inlets coupled to oneor more process gas sources; and (d) a controller for controllingoperations in the apparatus, including machine-readable instructionsfor: (i) introducing hydrogen without a chlorine-containing tungstenprecursor to the process chamber; and (ii) introducing achlorine-containing tungsten precursor without hydrogen to the processchamber; whereby the chamber pressure during (i) is no more than 10Torr.

In some embodiments, the controller further includes machine-readableinstructions for (iii) performing (i) and (ii) in cycles of alternatingbetween (i) and (ii), whereby a cycle of includes a pulse of hydrogenand a pulse of the chlorine-containing tungsten precursor.

In various embodiments, the pedestal is set to a temperature betweenabout 400° C. and about 600° C.

In some embodiments, the controller further includes machine-readableinstructions for introducing a reducing agent to the substrate for asoak treatment prior to introducing hydrogen and prior to introducingthe chlorine-containing tungsten precursor.

In some embodiments, the controller further includes machine-readableinstructions for introducing alternating pulses of a reducing agent andthe chlorine-containing tungsten precursor to the at least one processchamber to deposit a bulk tungsten layer on the substrate, whereby thereducing agent is selected from the group consisting of silanes,boranes, germanes, and combinations thereof.

These and other aspects are described further below with reference tothe drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a schematic illustration of example films on a substrate.

FIGS. 1B-1H are schematic examples of various structures in whichtungsten may be deposited in accordance with certain disclosedembodiments.

FIG. 2A is a process flow diagram depicting operations for methods inaccordance with certain disclosed embodiments.

FIG. 2B is a timing sequence diagram showing example cycles in a methodfor depositing films in accordance with certain disclosed embodiments.

FIGS. 3A-3J are schematic diagrams of an example of a mechanism fordepositing films in accordance with certain disclosed embodiments.

FIG. 4 is a schematic diagram of an example process tool for performingcertain disclosed embodiments.

FIG. 5 is a schematic diagram of an example station for performingcertain disclosed embodiments.

FIG. 6 is a graph of experimental results showing total tungstendeposited as a function of cycles.

FIG. 7 is a graph of experimental results showing resistivity as afunction of thickness of a tungsten film.

DETAILED DESCRIPTION

In the following description, numerous specific details are set forth toprovide a thorough understanding of the presented embodiments. Thedisclosed embodiments may be practiced without some or all of thesespecific details. In other instances, well-known process operations havenot been described in detail to not unnecessarily obscure the disclosedembodiments. While the disclosed embodiments will be described inconjunction with the specific embodiments, it will be understood that itis not intended to limit the disclosed embodiments.

Tungsten (W) fill of features is often used in semiconductor devicefabrication to form electrical contacts. In conventional methods ofdepositing tungsten films, a nucleation tungsten layer is firstdeposited into a via or contact. In general, a nucleation layer is athin conformal layer that serves to facilitate the subsequent formationof a bulk material thereon. The tungsten nucleation layer may bedeposited to conformally coat the sidewalls and bottom of the feature.Conforming to the underlying feature bottom and sidewalls can becritical to support high quality deposition. Nucleation layers are oftendeposited using atomic layer deposition (ALD) or pulsed nucleation layer(PNL) methods.

In a PNL technique, pulses of reactant are sequentially injected andpurged from the reaction chamber, typically by a pulse of a purge gasbetween reactants. A first reactant can be adsorbed onto the substrate,available to react with the next reactant. The process is repeated in acyclical fashion until the desired thickness is achieved. PNL is similarto ALD techniques. PNL is generally distinguished from ALD by its higheroperating pressure range (greater than 1 Torr) and its higher growthrate per cycle (greater than 1 monolayer film growth per cycle). Chamberpressure during PNL deposition may range from about 1 Torr to about 400Torr. In the context of the description provided herein, PNL broadlyembodies any cyclical process of sequentially adding reactants forreaction on a semiconductor substrate. Thus, the concept embodiestechniques conventionally referred to as ALD. In the context of thedisclosed embodiments, chemical vapor deposition (CVD) embodiesprocesses in which reactants are together introduced to a reactor for avapor-phase reaction. PNL and ALD processes are distinct from CVDprocesses and vice versa.

After the tungsten nucleation layer is deposited, bulk tungsten istypically deposited by a CVD process by reducing tungsten hexafluoride(WF₆) using a reducing agent such as hydrogen (H₂). Bulk tungsten isdifferent from a tungsten nucleation layer. Bulk tungsten as used hereinrefers to tungsten used to fill most or all of a feature, such as atleast about 50% of the feature. Unlike a nucleation layer, which is athin conformal films that serves to facilitate the subsequent formationof a bulk material thereon, bulk tungsten is used to carry current. Invarious embodiments, bulk tungsten is tungsten deposited to a thicknessof at least 50 Å.

There are various challenges in tungsten fill as devices scale tosmaller technology nodes and more complex patterning structures areused. Conventional deposition of tungsten has involved the use of thefluorine-containing precursor tungsten hexafluoride (WF₆). However, theuse of WF₆ results in some incorporation of fluorine into the depositedtungsten film. The presence of fluorine can cause electromigrationand/or fluorine diffusion into adjacent components and damages contacts,thereby reducing the performance of the device. One challenge isreducing the fluorine concentration or content in the deposited tungstenfilm. As compared to larger features, a smaller feature having the samefluorine concentration in the tungsten film as a larger feature affectsthe performance of the device more substantially. For example, thesmaller the feature, the thinner the films are deposited. As a result,fluorine in the deposited tungsten film is more likely to diffusethrough the thinner films, thereby potentially causing device failure.

One method of preventing fluorine diffusion includes depositing one ormore barrier layers prior to depositing tungsten to prevent fluorinefrom diffusing from tungsten to other layers of the substrate such as anoxide layer. For example, FIG. 1A shows an example stack of layersdeposited on a substrate. Substrate 190 includes a silicon layer 192, anoxide layer 194 (e.g., titanium oxide (TiOx), tetraethyl orthosilicate(TEOS) oxide, etc.), a barrier layer 196 (e.g., titanium nitride (TiN)),a tungsten nucleation layer 198, and a bulk tungsten layer 199. Barrierlayer 196 is deposited to prevent fluorine diffusion from the bulktungsten layer 199 and the tungsten nucleation layer 198 to the oxidelayer. However, as devices shrink, barrier layers become thinner, andfluorine may still diffuse from the deposited tungsten layers. Althoughchemical vapor deposition of bulk tungsten performed at a highertemperature results in lower fluorine content, such films have poor stepcoverage.

Another challenge is reducing resistance in the deposited tungstenfilms. Thinner films tend to have higher resistance than thicker films.As features become smaller, the tungsten contact or line resistanceincreases due to scattering effects in the thinner tungsten films. Lowresistivity tungsten films minimize power losses and overheating inintegrated circuit designs. Tungsten nucleation layers typically havehigher electrical resistivities than the overlying bulk layers. Barrierlayers deposited in contacts, vias, and other features, may also havehigh resistivities. Further, thin barrier and tungsten nucleation filmsoccupy a larger percentage of smaller features, increasing the overallresistance in the feature. Resistivity of a tungsten film depends on thethickness of the film deposited, such that resistivity increases asthickness decreases due to boundary effects.

Another challenge is reducing stress on deposited films. Thinnertungsten films tend to have increased tensile stress. Conventionaltechniques for depositing bulk tungsten films by chemical vapordeposition have a tensile stress greater than 2.5 GPa for a 200 Å film.High thermal tensile stress causes the substrate to curl, which makessubsequent processing difficult. For example, subsequent processes mayinclude chemical mechanical planarization, deposition of materials,and/or clamping of the substrate to a substrate holder to performprocesses in a chamber. However, these processes often rely on thesubstrate being flat, and a curled substrate results in nonuniformprocessing or inability to process the substrate. Although there areexisting methods for reducing stress in films of other materials such asannealing, tungsten does not have the surface mobility to allow grainsto be moved or altered once it is deposited due to its high meltingpoint.

Fluorine-free tungsten (FFW) precursors are useful to prevent suchreliability and integration issues or device performance issues. CurrentFFW precursors include metal organic precursors, but undesirable tracesof elements from the metal organic precursors may be incorporated in thetungsten film as well, such as carbon, hydrogen, nitrogen, and oxygen.Some metal organic fluorine-free precursors are also not easilyimplemented or integrated in tungsten deposition processes.

Provided herein are methods of depositing fluorine-free tungsten filmshaving using a sequential CVD process using a chlorine-containingtungsten precursor, or tungsten chloride (WCl_(x)). Tungsten chlorideincludes tungsten pentachloride (WCl₅), tungsten hexachloride (WCl₆),tungsten tetrachloride (WCl₄), tungsten dichloride (WCl₂), and mixturesthereof. Although examples herein refer to WCl₅ and WCl₆ as examples, itis understood that other tungsten chlorides may be used with disclosedembodiments. Films deposited using certain disclosed embodiments arefluorine-free. Certain disclosed embodiments are directed to depositingbulk tungsten using alternating pulses of a chlorine-containing tungstenprecursor and hydrogen.

Alternatively, while certain disclosed embodiments described herein aredirected to deposition of bulk tungsten films, in some embodiments,certain disclosed embodiments may be used to deposit tungsten filmshaving a thickness of less than about 50 Å, which can exhibit lowresistivity as shown in FIG. 7 and described in further detail below.Certain disclosed embodiments deposit thin tungsten films havingsubstantially lower resistivity than tungsten films deposited to thesame thickness using fluorine-containing tungsten precursors. In variousembodiments, tungsten films deposited to a thickness less than about 50Å using alternating pulses of a chlorine-containing tungsten precursorand hydrogen exhibits a resistivity of less than about 150 μΩ-cm asshown in FIG. 7. In some embodiments, films deposited to a thicknessless than 50 Å may be used to fill features having a small featureopening, such as a feature opening between about 25 Å and about 30 Å. Insome embodiments, fluorine-free tungsten deposited using certaindisclosed embodiments may be integrated with other tungsten filmdeposition processes.

Deposition by WCl₅ and WCl₆ presents challenges that are not presentwith WF₆, due to the latter compound's greater reactivity and tungstenchloride's possible etching character. Evaporated WCl₆ has a high enoughvapor pressure to enable carrying it into the tungsten depositionchamber. However, WCl₆ may be more likely to etch the substrate thanWCl₅. While WCl₅ is less likely to etch the substrate, WCl₅ also has ahigher vapor pressure than WCl₆. Although the lower vapor pressure isuseful in depositing tungsten films having low resistivity, somedeposition may have poor step coverage. Tungsten chlorides are lessreactive, and as a result, deposition is performed at higher temperaturethan deposition using WF₆. In certain disclosed embodiments, low amountsof a chlorine-containing tungsten precursor are used during a pulse ofthe chlorine-containing tungsten precursor to prevent etching. Forexample, in some embodiments, during a pulse of a chlorine-containingtungsten precursor, the amount of chlorine-containing tungsten precursormay be between about 0.1% and about 1.5% of the volume of the mixture ofgases flowed during the pulse.

Disclosed embodiments may be integrated with other tungsten depositionprocesses to deposit a tungsten film having substantially lowerresistivity than films deposited by conventional CVD. Additionally, aschlorine-containing tungsten precursors are used to deposit tungsten,deposited films are fluorine-free. In some embodiments, a soak treatmentusing a reducing agent such as a borane, silane, or germane may be usedprior to exposing a substrate to alternating pulses of achlorine-containing tungsten precursor and hydrogen. Another example mayinclude depositing tungsten using a combination of alternating pulses ofa chlorine-containing tungsten precursor and hydrogen with any one ormore of the following: tungsten deposition by CVD using achlorine-containing tungsten precursor, tungsten deposition by CVD usinga metal organic tungsten precursor, tungsten nucleation deposition usinga chlorine-containing tungsten precursor, tungsten nucleation depositionusing a tungsten precursor such as WF₆, and tungsten deposition by CVDusing a tungsten precursor such as WF₆. Disclosed embodiments have awide variety of applications. Methods may be used to deposit tungsteninto features with high step coverage, and may also be used to deposittungsten into 3D NAND and vertical NAND structures, including those withdeep trenches.

Methods described herein involve introducing hydrogen and achlorine-containing tungsten precursor in alternating pulses to deposittungsten in a feature without depositing a tungsten nucleation layer.Methods described herein introducing hydrogen and a chlorine-containingtungsten precursor in alternating pulses to deposit bulk tungsten in afeature having an untreated surface. In some embodiments, methodsinvolve introducing hydrogen and a chlorine-containing tungstenprecursor in alternating pulses to deposit bulk tungsten in an untreatedfeature without depositing a tungsten nucleation layer. An untreatedsurface is a surface of a substrate and/or feature that is not exposedto a soak treatment or not exposed to a pre-treatment prior todepositing bulk tungsten. For example, tungsten is deposited directlyonto a substrate having an untreated barrier layer (such as titaniumnitride) by exposing the substrate to alternating pulses of hydrogen andtungsten hexachloride.

Alternating pulses of hydrogen and a chlorine-containing tungstenprecursor as described herein may be performed by introducing temporallyseparated pulses sequentially in cycles. Such temporally separatedpulses made sequentially in cycles may be referred to herein as“sequential CVD.” It will be understood that in some embodiments, notall reactants in a dose react with the reactants provided in anotherdose, as further described below. Alternating pulses of hydrogen and achlorine-containing tungsten precursor as described herein may beperformed by atomic layer deposition (ALD).

Unlike conventional deposition of tungsten whereby pulsing and/orsimultaneous exposure of WF₆ and H₂ has little to no growth on asubstrate surface, it is unexpected that chlorine-containing tungstenprecursors exhibit growth on a substrate surface when reacted with H₂without any nucleation layer or treatment of the surface prior todeposition of tungsten. This is particularly significant in that inconventional deposition, in order to deposit tungsten without depositinga nucleation layer, the substrate surface is pre-treated using a soak ortreatment process. Additionally, in order to deposit tungstenconventionally using hydrogen and a fluorine-containing tungstenprecursor, a nucleation layer is first deposited on the surface using aboron-containing or silicon-containing reducing agent and WF₆ before thesurface is able to grow tungsten using exposure to WF₆ and H₂.

Sequential CVD processes are distinguished from non-sequential CVD,pulsed CVD, atomic layer deposition (ALD), and nucleation layerdeposition. Non-sequential CVD processes involve simultaneous exposureof two reactants, such that both reactants are flowed at the same timeduring deposition. For example, tungsten may be deposited by exposing asubstrate to hydrogen (H₂) and tungsten hexachloride (WCl₆) at the sametime for a duration sufficient to fill features. Hydrogen and WF₆ reactduring the exposure to deposit tungsten into the features. In pulsed CVDprocesses, one reactant is continuously flowed while the other reactantis pulsed, but the substrate is exposed to both reactants duringdeposition to deposit material during each pulse. For example, asubstrate may be exposed to a continuous flow of H₂ while WF₆ is pulsed,and WF₆ and H₂ react during the pulse to deposit tungsten.

In contrast, sequential CVD processes implement separate exposures toeach reactant such that the reactants are not flowed into the chamber atthe same time during deposition. Rather, each reactant flow isintroduced to a chamber housing the substrate in temporally separatedpulses in sequence, repeated one or more times in cycles. Generally acycle is the minimum set of operations used to perform a surfacedeposition reaction one time. The result of one cycle is the productionof at least a partial film layer on a substrate surface. Cycles ofsequential CVD are described in further detail below.

ALD and nucleation layer deposition also involve exposing the substrateto two reactants in temporally separated pulses in cycles. For example,in an ALD cycle, a first reactant is flowed into a chamber, the chamberis purged, a second reactant is flowed into the chamber, and the chamberis again purged. Such cycles are typically repeated to build filmthickness. In conventional ALD and nucleation layer deposition cycles,the first reactant flow constitutes a first “dose” in a self-limitingreaction. For example, a substrate includes a limited number of activesites whereby a first reactant is adsorbed onto the active sites on thesubstrate and saturates the surface, and a second reactant reacts withthe adsorbed layer to deposit material layer by layer in cycles.

However, in sequential CVD, reactants do not necessarily adsorb ontoactive sites on the substrate and in some embodiments, the reaction maynot be self-limiting. For example, reactants used in sequential CVD mayhave a low adsorption rate. Moreover, reactants on the surface of thesubstrate may not necessarily react with a second reactant when thesecond reactant is introduced. Rather, in some embodiments of sequentialCVD, some reactants on the substrate remain unreacted during the cycle,and are not reacted until a subsequent cycle. Some reactants may notreact due to stoichiometric properties, steric hindrance, or othereffects. It will be understood that any of the processes describedherein may be applicable to techniques involving ALD. Embodimentsdescribed herein may involve sequential CVD, ALD, or both.

Methods described herein are performed on a substrate that may be housedin a chamber. The substrate may be a silicon wafer, e.g., a 200-mmwafer, a 300-mm wafer, or a 450-mm wafer, including wafers having one ormore layers of material, such as dielectric, conducting, orsemi-conducting material deposited thereon. Substrates may have featuressuch as via or contact holes, which may be characterized by one or moreof narrow and/or re-entrant openings, constrictions within the feature,and high aspect ratios. A feature may be formed in one or more of theabove described layers. For example, the feature may be formed at leastpartially in a dielectric layer. In some embodiments, a feature may havean aspect ratio of at least about 2:1, at least about 4:1, at leastabout 6:1, at least about 10:1, at least about 25:1, or higher. Oneexample of a feature is a hole or via in a semiconductor substrate or alayer on the substrate

FIGS. 1B-1H are schematic examples of various structures in whichtungsten may be deposited in accordance with disclosed embodiments. FIG.1B shows an example of a cross-sectional depiction of a vertical feature101 to be filled with tungsten. The feature can include a feature hole105 in a substrate 103. The hole 105 or other feature may have adimension near the opening, e.g., an opening diameter or line width ofbetween about 10 nm to 500 nm, for example between about 25 nm and about300 nm. The feature hole 105 can be referred to as an unfilled featureor simply a feature. The feature 101, and any feature, may becharacterized in part by an axis 118 that extends through the length ofthe feature, with vertically-oriented features having vertical axes andhorizontally-oriented features having horizontal axes.

In some embodiments, features are trenches in a 3D NAND structure. Forexample, a substrate may include a wordline structure having at least 60lines, with between 18 to 48 layers, with trenches at least 200 Å deep.Another example is a trench in a substrate or layer. Features may be ofany depth. In various embodiments, the feature may have an under-layer,such as a barrier layer or adhesion layer. Non-limiting examples ofunder-layers include dielectric layers and conducting layers, e.g.,silicon oxides, silicon nitrides, silicon carbides, metal oxides, metalnitrides, metal carbides, and metal layers.

FIG. 1C shows an example of a feature 101 that has a re-entrant profile.A re-entrant profile is a profile that narrows from a bottom, closedend, or interior of the feature to the feature opening. According tovarious implementations, the profile may narrow gradually and/or includean overhang at the feature opening. FIG. 1C shows an example of thelatter, with an under-layer 113 lining the sidewall or interior surfacesof the feature hole 105. The under-layer 113 can be for example, adiffusion barrier layer, an adhesion layer, a nucleation layer, acombination of thereof, or any other applicable material. Non-limitingexamples of under-layers can include dielectric layers and conductinglayers, e.g., silicon oxides, silicon nitrides, silicon carbides, metaloxides, metal nitrides, metal carbides, and metal layers. In particularimplementations an under-layer can be one or more of titanium, titaniumnitride, tungsten nitride, titanium aluminide, and tungsten. In someembodiments, the under-layer is tungsten-free. The under-layer 113 formsan overhang 115 such that the under-layer 113 is thicker near theopening of the feature 101 than inside the feature 101.

In some implementations, features having one or more constrictionswithin the feature may be filled. FIG. 1D shows examples of views ofvarious filled features having constrictions. Each of the examples (a),(b) and (c) in FIG. 1D includes a constriction 109 at a midpoint withinthe feature. The constriction 109 can be, for example, between about 15nm-20 nm wide. Constrictions can cause pinch off during deposition oftungsten in the feature using conventional techniques, with depositedtungsten blocking further deposition past the constriction before thatportion of the feature is filled, resulting in voids in the feature.Example (b) further includes a liner/barrier overhang 115 at the featureopening. Such an overhang could also be a potential pinch-off point.Example (c) includes a constriction 112 further away from the fieldregion than the overhang 115 in example (b).

Horizontal features, such as in 3-D memory structures, can also befilled. FIG. 1E shows an example of a horizontal feature 150 thatincludes a constriction 151. For example, horizontal feature 150 may bea word line in a VNAND structure.

In some implementations, the constrictions can be due to the presence ofpillars in a VNAND or other structure. FIG. 1F, for example, shows aplan view of pillars 125 in a VNAND or vertically integrated memory(VIM) structure 148, with FIG. 1G showing a simplified schematic of across-sectional depiction of the pillars 125. Arrows in FIG. 1Frepresent deposition material; as pillars 125 are disposed between anarea 127 and a gas inlet or other deposition source, adjacent pillarscan result in constrictions 151 that present challenges in void freefill of an area 127.

The structure 148 can be formed, for example, by depositing a stack ofalternating interlayer dielectric layers 129 and sacrificial layers (notshown) on a substrate 100 and selectively etching the sacrificiallayers. The interlayer dielectric layers may be, for example, siliconoxide and/or silicon nitride layers, with the sacrificial layers amaterial selectively etchable with an etchant. This may be followed byetching and deposition processes to form pillars 125, which can includechannel regions of the completed memory device.

The main surface of substrate 100 can extend in the x and y directions,with pillars 125 oriented in the z-direction. In the example of FIGS. 1Fand 1G, pillars 125 are arranged in an offset fashion, such that pillars125 that are immediately adjacent in the x-direction are offset witheach other in the y-direction and vice versa. According to variousimplementations, the pillars (and corresponding constrictions formed byadjacent pillars) may be arranged in any number of manners. Moreover,the pillars 125 may be any shape including circular, square, etc.Pillars 125 can include an annular semi-conducting material, or circular(or square) semi-conducting material. A gate dielectric may surround thesemi-conducting material. The area between each interlayer dielectriclayer 129 can be filled with tungsten; thus structure 148 has aplurality of stacked horizontally-oriented features that extend in the xand/or y directions to be filled.

FIG. 1H provides another example of a view of a horizontal feature, forexample, of a VNAND or other structure including pillar constrictions151. The example in FIG. 1H is open-ended, with material to be depositedable to enter horizontally from two sides as indicated by the arrows.(It should be noted that example in FIG. 1H can be seen as a 2-Drendering 3-D features of the structure, with the FIG. 1H being across-sectional depiction of an area to be filled and pillarconstrictions shown in the figure representing constrictions that wouldbe seen in a plan rather than cross-sectional view.) In someimplementations, 3-D structures can be characterized with the area to befilled extending along two or three dimensions (e.g., in the x and y orx, y and z-directions in the example of FIG. 1G), and can present morechallenges for fill than filling holes or trenches that extend along oneor two dimensions. For example, controlling fill of a 3-D structure canbe challenging as deposition gasses may enter a feature from multipledimensions.

Examples of feature fill for horizontally-oriented andvertically-oriented features are described below. It should be notedthat in most cases, the examples applicable to bothhorizontally-oriented or vertically-oriented features. Moreover, itshould also be noted that in the description below, the term “lateral”may be used to refer to a direction generally orthogonal to the featureaxis and the term “vertical” to refer to a direction generally along thefeature axis.

While the description below focuses on tungsten feature fill, aspects ofthe disclosure may also be implemented in filling features with othermaterials. For example, feature fill using one or more techniquesdescribed herein may be used to fill features with other materialsincluding other tungsten-containing materials (e.g., tungsten nitride(WN) and tungsten carbide (WC)), titanium-containing materials (e.g.,titanium (Ti), titanium nitride (TiN), titanium silicide (TiSi),titanium carbide (TiC) and titanium aluminide (TiAl)),tantalum-containing materials (e.g., tantalum (Ta), and tantalum nitride(TaN)), and nickel-containing materials (e.g., nickel (Ni) and nickelsilicide (NiSi). Further, the methods and apparatus disclosed herein arenot limited to feature fill, but can be used to deposit tungsten on anyappropriate surface including forming blanket films on planar surfaces.

FIG. 2A provides a process flow diagram for a method performed inaccordance with disclosed embodiments. Operations 202-210 of FIG. 2A areperformed to deposit a tungsten layer by sequential CVD directly onto asubstrate without depositing a tungsten nucleation layer. Prior tooperation 202, a substrate having no tungsten nucleation layer depositedthereon is provided. It will be understood that certain disclosedembodiments for depositing bulk tungsten may begin a cycle of depositionwith either exposure to a reducing agent dose (operation 202) or maybegin with a chlorine-containing tungsten precursor dose (operation206). Certain disclosed embodiments may be performed at a substratetemperature between about 400° C. and about 600° C., such as about 525°C. It will be understood that substrate temperature refers to thetemperature to which the pedestal holding the substrate is set. Certaindisclosed embodiments may be performed at a chamber pressure betweenabout 3 Torr and about 60 Torr. In some embodiments, chamber pressure isless than about 10 Torr. For example, in some embodiments chamberpressure is about 5 Torr.

In operation 202, the substrate is exposed to a reducing agent, such ashydrogen (H₂). This operation may be referred to as a “pulse” or a“dose,” which may be used interchangeably herein. In embodimentsdescribed herein, H₂ is provided as an example reducing agent, but itwill be understood that other reducing agents, including silanes,boranes, germanes, phosphines, hydrogen-containing gases, andcombinations thereof, may be used. In various embodiments, bulk tungstendeposition is performed using hydrogen as a reducing agent. Unlikenon-sequential CVD, H₂ is pulsed without flowing another reactant. Insome embodiments, a carrier gas may be flowed. In some embodiments, acarrier gas, such as nitrogen (N₂), argon (Ar), helium (He), or otherinert gases, may be flowed during operation 202.

Operation 202 may be performed for any suitable duration. In someexamples, Example durations include between about 0.25 seconds and about30 seconds, about 0.25 seconds and about 20 seconds, about 0.25 secondsand about 5 seconds, or about 0.5 seconds and about 3 seconds.

In operation 204, the chamber is optionally purged to remove excesshydrogen that did not adsorb to the surface of the substrate. A purgemay be conducted by flowing an inert gas at a fixed pressure therebyreducing the pressure of the chamber and re-pressurizing the chamberbefore initiating another gas exposure. Example inert gases includenitrogen (N₂), argon (Ar), helium (He), and mixtures thereof. The purgemay be performed for a duration between about 0.25 seconds and about 30seconds, about 0.25 seconds and about 20 seconds, about 0.25 seconds andabout 5 seconds, or about 0.5 seconds and about 3 seconds.

In operation 206, the substrate is exposed to a chlorine-containingtungsten precursor. Example chlorine-containing tungsten precursors havea chemical formula of WCl_(x), where x is an integer between andincluding 2 and 6, such as 2, 3, 4, 5, or 6. Examples include WCl₅ andWCl₆. The chlorine-containing tungsten precursor may include a mixtureof WCl_(x) compounds. In some embodiments, a carrier gas, such asnitrogen (N₂), argon (Ar), helium (He), or other inert gases, may beflowed during operation 206. In various embodiments, during operation206, the amount of chlorine-containing tungsten precursor by volume maybe between about 0.1% and about 1.5%.

Operation 206 may be performed for any suitable duration and at anysuitable temperature. In some examples, operation 206 may be performedfor a duration between about 0.25 seconds and about 30 seconds, about0.25 seconds and about 20 seconds, about 0.25 seconds and about 5seconds, or about 0.5 seconds and about 3 seconds. This operation may beperformed in some embodiments for a duration sufficient to saturate theactive sites on the surface of the substrate. In some embodiments,WCl_(x) may be diverted to fill the gas line and line change beforedosing. The carrier gas may be any of those described above with respectto operation 202.

During operation 206, some WCl_(x) may react with H₂ that remained onthe surface from the prior dose. During operation 206, some WCl_(x) maynot fully react with H₂ that remained on the surface from the priordose. Examples are further described below with respect to FIGS. 3D and3E.

During operation 206 of FIG. 2A, some H₂ may not react with WCl_(x) atall and WCl_(x) may instead be physisorbed onto the surface of thesubstrate where no H₂ physisorbed or remained on the substrate surface.In some embodiments, H₂ may remain on the substrate surface but may notbe physisorbed or chemisorbed to the surface.

Operation 206 of FIG. 2A may thereby form a sub-monolayer of tungsten inmany embodiments. For example, a sub-monolayer having a thickness ofabout 0.3 Å may be deposited after performing operations 202-206.

In operation 208, there may be an optional purge operation to purgeexcess chlorine-containing tungsten precursor still in gas phase thatdid not react with hydrogen on the surface of the feature. A purge maybe conducted by flowing an inert gas at a fixed pressure therebyreducing the pressure of the chamber and re-pressurizing the chamberbefore initiating another gas exposure.

The chamber may be purged for any suitable duration. The chamber may bepurged for a duration between about 0.25 seconds and about 30 seconds,about 0.25 seconds and about 20 seconds, about 0.25 seconds and about 5seconds, or about 0.5 seconds and about 3 seconds. In some embodiments,the purge duration is between about 0.1 seconds and about 2 seconds andmay prevent removing all of the WCl_(x) from the substrate surface dueto the low adsorption rate of WCl_(x) to a surface of tungsten. In someembodiments, purge duration is between about 0.1 seconds and about 15seconds, such as about 7 seconds. For example, for fabrication of a 3DNAND structure, the chamber may be purged for about 7 seconds duringoperation 288. The purge duration depends on the substrate and stress.The purge gas may be any of the gases described above with respect tooperation 204.

In operation 210, it is determined whether the tungsten layer has beendeposited to an adequate thickness. If not, operations 202-208 arerepeated until a desired thickness of a tungsten layer is deposited onthe surface of the feature. Each repetition of operations 202-208 may bereferred to as a “cycle.” In some embodiments, the order of operations202 and 206 may be reversed, such that a chlorine-containing tungstenprecursor is introduced first.

FIG. 2B provides a timing sequence diagram depicting examples cycles ofsequential CVD in a process for depositing tungsten. Note that in theexample provided in FIG. 2B, the hydrogen dose is performed prior todosing WCl_(x). Note that as shown in FIG. 2A, the reducing agent pulsemay be performed prior to exposure to a chlorine-containing tungstenprecursor in some embodiments. It will be understood that in someembodiments, the chlorine-containing tungsten precursor exposure may beperformed prior to a reducing agent pulse.

FIG. 2B shows H₂ dose 220A in deposition cycle 211A which may correspondwith operation 202 of FIG. 2A. During a H₂ dose 220A, a carrier gas isflowed, the reducing agent is pulsed, and WCl_(x) flow is turned off.Operation 204 of FIG. 2A may correspond to purge phase 240A of FIG. 2B.As shown in FIG. 2B, during purge phase 240A, the carrier gas is flowedbut H₂ flow and WCl_(x) flow are turned off. Operation 206 of FIG. 2Amay correspond to WCl_(x) dose 260A in FIG. 2B. As shown in FIG. 2B,during the WCl_(x) dose 260A, the carrier gas is flowed, the H₂ flow isturned off, and the WCl_(x) flow is turned on. Operation 208 of FIG. 2Amay correspond to purge phase 270A of FIG. 2B. As shown in FIG. 2B,purge phase 270A concludes deposition cycle 211A.

In FIG. 2B, it is determined that tungsten has not been deposited to anadequate thickness, so operations 202-208 of FIG. 2B are repeated indeposition cycle 211B, such that an H₂ dose 220B is performed, followedby a purge phase 240B. A WCl_(x) dose 260B is performed, followed byanother purge phase 270B.

FIGS. 3A-3J are schematic illustrations of an example mechanism forcycles of sequential CVD. FIG. 3A depicts an example mechanism where H₂is introduced to the substrate 300, which has an underlayer 301deposited thereon. Underlayer 301 may be a barrier layer in someembodiments. For example, in some embodiments, underlayer 301 is atitanium nitride layer. Note that the substrate 300 does not include atungsten nucleation layer. Hydrogen is introduced in gas phase (311 aand 311 b) and some H₂ (313 a and 313 b) is on the surface of theunderlayer 301, but may not necessarily adsorb onto the surface. Forexample, H₂ may not necessarily chemisorb onto the underlayer 301, butin some embodiments, may physisorb onto the surface of the underlayer301.

FIG. 3B shows an example illustration whereby H₂ previously in gas phase(311 a and 311 b in FIG. 3A) are purged from the chamber, and H₂previously on the surface (313 a and 313 b) remain on the surface of theunderlayer 301.

FIG. 3C shows an example schematic illustration whereby the substrate isexposed to WCl₆, some of which is in gas phase (331 a and 331 b) andsome of which is at or near the surface of the substrate (323 a and 323b).

During operation 202, some H₂ may react with WCl₆ that remained on thesurface from the prior dose. In FIG. 3D, WCl₆ may react with H₂ totemporarily form intermediate 343 b, whereby in FIG. 3E, intermediate343 b fully reacts to leave tungsten 390 on the surface of the substrate300 on the underlayer 301, and HF in gas phase (351 a and 351 b, forexample). Note that in this example, tungsten 390 grows directly on theunderlayer 301 without depositing a nucleation layer and withouttreating the underlayer 301 prior to depositing tungsten. It will beunderstood that in some embodiments, prior to exposing the underlayer301 to hydrogen or a chlorine-containing tungsten precursor, theunderlayer 301 may be exposed to a soak treatment, such as by exposingto diborane.

During operation 202, some H₂ may not fully react with WCl₆ thatremained on the surface from the prior dose. As shown in FIG. 3D, WCl₆may partially react with H₂ to form intermediate 343 a, whereby in FIG.3E, intermediate 343 a remains partially reacted on the surface of thesubstrate 300 on the underlayer 301. The reaction mechanism involvingWCl₆ and H₂ may be slower than a reaction between a borane or a silaneor a germane with WCl₆ for deposition of a tungsten layer due toactivation energy barriers and steric effects. In various embodiments,the film deposited using a chlorine-containing tungsten precursor andhydrogen has a lower resistivity than a film deposited using a borane,silane, or germane, for deposition thicknesses up to about 50 Å. Forexample, without being bound by a particular theory, the stoichiometryof WCl₆ may use at least three H₂ molecules to react with one moleculeof WCl₆. It is possible that WCl₆ partially reacts with molecules of H₂but rather than forming tungsten, an intermediate is formed. Forexample, this may occur if there is not enough H₂ in its vicinity toreact with WCl₆ based on stoichiometric principles (e.g., three H₂molecules are used to react with one molecule of WCl₆) thereby leavingan intermediate 343 a on the surface of the substrate.

FIG. 3F provides an example schematic of the substrate when the chamberis purged. This may correspond to operation 204 of FIG. 2A. Note thatcompound 343 c of FIG. 3F may be an intermediate formed but notcompletely reacted, while some tungsten 390 may be formed on thesubstrate. Each cycle thereby forms a sub-monolayer of tungsten on thesubstrate.

As an example, FIG. 3G shows an illustration when a cycle is repeated,whereby H₂ 311 c in gas phase is introduced to the substrate with thedeposited tungsten 390 and the partially reacted intermediate 343 dthereon. This may correspond to operation 202 of FIG. 2A in a repeatedcycle after determining in operation 210 that tungsten has not beendeposited to an adequate thickness. Note that as shown in FIG. 3G, theH₂ introduced may now fully react with the intermediate 343 d on thesubstrate such that, as shown in FIG. 3H, the reacted compound 343 dleaves behind deposited tungsten 390 b and 390 c, and byproducts HCl 351c and 351 d are formed in gas phase. Some H₂ 311 c may remain in gasphase, while some H₂ 313 c may remain on the tungsten layer 390 a.

In FIG. 3I, the chamber is purged (thereby corresponding with operation204 of FIG. 2A, or operation 240B of FIG. 2B), leaving behind depositedtungsten 390 a, 390 b, and 390 c, and some H₂ 313 c. In FIG. 3J, WCl₆ isagain introduced in a dose such that molecules 331 c and 323 c may thenadsorb and/or react with H₂ and the substrate. FIG. 3J may correspond tooperation 206 of FIG. 2A or 260B of FIG. 2B. After the WCl₆ dose, thechamber may again be purged and cycles may be repeated again until thedesired thickness of tungsten is deposited.

Tungsten films deposited using certain disclosed embodiments have nofluorine content, as compared to tungsten deposited using conventionalfluorine-containing tungsten precursors. Overall tensile stress of filmsmay be less than about 0.2 GPa.

Disclosed embodiments may have various applications in tungstendeposition processes. It will be understood that various combinations ofthe applications described herein may be used to deposit tungsten andmethods are not limited to the examples provided herein.

For example, in some embodiments, a feature may be filled by depositinga tungsten nucleation layer by ALD cycles of alternating pulses of areducing agent (e.g., a borane, a silane, or a germane) and WCl₆,followed by bulk tungsten deposition by alternating pulses of hydrogenand a chlorine-containing tungsten precursor as described above withrespect to FIG. 2A.

In another example, in some embodiments, a tungsten nucleation layer maybe deposited using ALD cycles of a reducing agent and WCl₆, followed bybulk tungsten deposition using a combination of CVD of fluorine-freetungsten using a reducing agent and a fluorine-free tungsten-containingprecursor (e.g., a metal-organic tungsten precursor), and alternatingpulses of hydrogen and a chlorine-containing tungsten precursor asdescribed above with respect to FIG. 2A. Fluorine-free tungstenprecursors may also include tungsten carbonyl (W(CO)₆), and tungstenchlorides (WCl_(x)) such as tungsten pentachloride (WCl₅) and tungstenhexachloride (WCl₆).

In another example, a tungsten nucleation layer may be deposited on afeature by ALD cycles of alternating pulses of a reducing agent andWCl₆, and tungsten bulk may be deposited by alternating betweensequential CVD and non-sequential CVD. For example, bulk tungsten may bedeposited using a number of cycles of sequential CVD using alternatingpulses of hydrogen and a chlorine-containing tungsten precursor betweenpre-determined durations of non-sequential CVD. In a specific example,bulk tungsten may be deposited using about 5 cycles of sequential CVD,followed by 5 seconds of non-sequential CVD, followed by 5 cycles ofsequential CVD, and another 5 seconds of non-sequential CVD.

In another example, a feature may be filled by first depositing atungsten nucleation layer by ALD cycles of alternating pulses of areducing agent and WCl₆, then partially filling the feature usingsequential CVD, and filling the rest of the feature by non-sequentialCVD.

In another example, a feature may be filled by depositing a tungstennucleation layer by ALD cycles of alternating pulses of a reducing agentand WCl₆, followed by partial deposition of bulk tungsten by sequentialCVD, and complete bulk fill by CVD of fluorine-free tungsten (such asusing a metal-organic tungsten precursor). For example, a number ofcycles of sequential CVD using a chlorine-containing tungsten precursormay be performed to partially fill a feature with bulk tungsten,followed by CVD using simultaneous exposure to a metal organic tungstenprecursor and H₂ to fill the rest of the feature. Note in someembodiments, a feature may be filled without depositing a nucleationlayer, but a nucleation layer may help reduce growth delay of bulktungsten.

In various embodiments, a soak or surface treatment operation may beperformed prior to depositing a nucleation layer. Example soak orsurface treatments include exposing the substrate to silane (SiH₄),disilane (Si₂H₆), trisilane (Si₃H₈), germane (GeH₄), argon (Ar),tungsten hexafluoride (WF₆), diborane (B₂H₆), hydrogen (H₂), nitrogen(N₂) gas, or combinations thereof. In some embodiments, the substratemay be soaked using one or more gases. For example, in some embodiments,the substrate may be exposed to silane for a first duration, and thenexposed to diborane for a second duration. Such operations may also berepeated in cycles. In another example, the substrate may be exposed todiborane for a first duration, and then exposed to silane for a secondduration. In another example, the substrate may be exposed to diboranefor a first duration, and then exposed to hydrogen for a secondduration. In another example, the substrate may be exposed to silane fora first duration, and then exposed to hydrogen for a second duration. Insome embodiments, the substrate may be exposed to nitrogen gas incombination with any of the above described soaking processes. In any ofthe disclosed embodiments, a chamber housing the substrate may be purgedbetween one or more soak operations. Purging may be performed by flowingan inert gas such as argon into the chamber. For example, in oneexample, the substrate may be exposed to diborane for a first duration,the chamber may then be purged, and then the substrate may be exposed tosilane for a second duration.

Bulk tungsten deposition may be deposited using any of the disclosedembodiments described herein and in some embodiments may be integratedwith embodiments described in U.S. patent application Ser. No.14/723,275 (Attorney Docket No. LAMRP183/3623-1US) filed on May 27,2015, which is herein incorporated by reference in its entirety. In anyof the above described implementations, bulk tungsten may also bedeposited periodically, with soak and/or surface treatment and/orconventional CVD deposition operations performed between bulkdepositions. Bulk tungsten deposition is performed without depositing atungsten nucleation layer. In various embodiments, bulk tungsten isdeposited directly on a substrate using certain disclosed embodiments.In various embodiments, bulk tungsten is deposited directly on asubstrate using certain disclosed embodiments before any tungsten isdeposited on the substrate. In various embodiments, bulk tungsten isdeposited directly on a substrate using certain disclosed embodiments.In various embodiments, bulk tungsten is deposited directly in a featureon a substrate using certain disclosed embodiments before any tungstenis deposited in a feature on the substrate.

In another example, in some embodiments, bulk tungsten may be depositedusing disclosed embodiments as described above with respect to FIG. 2A,then bulk tungsten deposition may be paused, then the substrate may beexposed to a soak or surface treatment by flowing any of silane,disilane, trisilane, germane, diborane, hydrogen, tungsten hexafluoride,nitrogen, argon, and combinations thereof, to treat the surface of thesubstrate, then the bulk tungsten deposition may be resumed usingdisclosed embodiments as described above with respect to FIG. 2A. Bulktungsten deposition may be performed by exposing the substrate to atungsten-containing precursor such as WCl₆ and any one or more of thefollowing gases: hydrogen, silane, disilane, trisilane, diborane,nitrogen, argon, and germane. Bulk tungsten may also be deposited usinga combination of sequential CVD and conventional CVD. Conventional CVDmay be performed before, during (such as by cycling between sequentialand conventional CVD), or after depositing bulk tungsten usingsequential CVD.

In some embodiments, the substrate may be annealed at any suitabletemperature before depositing bulk tungsten and after depositing thenucleation layer. In some embodiments, the substrate may be annealed atany suitable temperature after depositing the bulk tungsten layer. Insome embodiments, the substrate may be annealed at any suitabletemperature during intermediate times during deposition of the bulktungsten. Annealing may be performed in any suitable gas environment,such as an environment including one or more of the following gases:tungsten-containing gas such as WCl₆, hydrogen, silane, disilane,trisilane, diborane, nitrogen, argon, and germane.

In various embodiments, the chamber housing the substrate may be pumpedor purged before or after doses of the tungsten-containing precursor andreducing agent for depositing bulk tungsten in accordance with disclosedembodiments as described above with respect to FIG. 2A. In someembodiments, delay time may be incorporated into a dose or purge step ofsequential CVD deposition as described herein. In some embodiments, oneor more gases may be co-flowed during a dose or purge operation usingone or more of any of the following gases: WCl₆, hydrogen, silane,disilane, trisilane, diborane, nitrogen, argon, and germane.

Disclosed embodiments may be performed at any suitable pressure, such aspressures greater than about 10 Torr, or pressures less than about 10Torr. For a multi-station chamber, each pedestal may be set at differenttemperatures. In some embodiments, each pedestal is set at the sametemperature. Substrates may be cycled from station to station during anyor all of any of the above described operations in accordance withdisclosed embodiments. Chamber pressure may also be modulated in one ormore operations of certain disclosed embodiments. In some embodiments,chamber pressure during nucleation deposition is different from chamberpressure during bulk deposition. In some embodiments, chamber pressureduring nucleation deposition is the same as the chamber pressure duringbulk deposition.

During any of the above described exposures, the gases may be pulsed orflowed continuously. For example, in some embodiments, during a WCl₆dose of a sequential CVD operation, WCl₆ may be pulsed one or more timesduring a single dose. Likewise, in some embodiments, during a purge, aninert gas may be pulsed during one or more times during a single purgeoperation. Such pulsing operations may be performed during any operationof nucleation deposition or any operation of bulk deposition or anycombination thereof. In some embodiments, one or more changes to one ormore parameters such as pressure, flow rate, and temperature, may beused. In some embodiments, the pedestal may be moved during anyoperation of the nucleation deposition or bulk deposition or both suchthat the gap between the substrate and a showerhead over the pedestalmay be modulated. Moving the pedestal may be used in combination withaltering one or more parameters such as pressure, temperature, or flowrate. Modulating the gap between the substrate and the showerhead canaffect the pressure, temperature, or flow rate that may be used inaccordance with certain disclosed embodiments.

Apparatus

Any suitable chamber may be used to implement the disclosed embodiments.Example deposition apparatuses include various systems, e.g., ALTUS® andALTUS® Max, available from Lam Research Corp., of Fremont, Calif., orany of a variety of other commercially available processing systems. Insome embodiments, sequential chemical vapor deposition (CVD) may beperformed at a first station that is one of two, five, or even moredeposition stations positioned within a single deposition chamber. Thus,for example, hydrogen (H₂) and tungsten hexachloride (WCl₆) may beintroduced in alternating pulses to the surface of the semiconductorsubstrate, at the first station, using an individual gas supply systemthat creates a localized atmosphere at the substrate surface. Anotherstation may be used for fluorine-free tungsten deposition, ornon-sequential CVD. Two or more stations may be used to deposit tungstenin a parallel processing. Alternatively a wafer may be indexed to havethe sequential CVD operations performed over two or more stationssequentially.

FIG. 4 is a block diagram of a processing system suitable for conductingtungsten thin film deposition processes in accordance with embodiments.The system 400 includes a transfer module 403. The transfer module 403provides a clean, pressurized environment to minimize risk ofcontamination of substrates being processed as they are moved betweenvarious reactor modules. Mounted on the transfer module 403 is amulti-station reactor 409 capable of performing atomic layer deposition(ALD), and sequential CVD according to embodiments. Multi-stationreactor 409 may also be used to perform fluorine-free tungstendeposition and/or non-sequential CVD in some embodiments. Reactor 409may include multiple stations 411, 413, 415, and 417 that maysequentially perform operations in accordance with disclosedembodiments. For example, reactor 409 could be configured such thatstation 411 performs a first sequential CVD operation using achlorine-containing tungsten precursor, station 413 performs a secondsequential CVD operation, station 415 performs fluorine-free tungstendeposition, and station 417 performs non-sequential CVD. Stations mayinclude a heated pedestal or substrate support, one or more gas inletsor showerhead or dispersion plate. An example of a deposition station500 is depicted in FIG. 5, including substrate support 502 andshowerhead 503. A heater may be provided in pedestal portion 501.

Also mounted on the transfer module 403 may be one or more single ormulti-station modules 407 capable of performing plasma or chemical(non-plasma) pre-cleans. The module may also be used for varioustreatments to, for example, prepare a substrate for a depositionprocess. The system 400 also includes one or more wafer source modules401, where wafers are stored before and after processing. An atmosphericrobot (not shown) in the atmospheric transfer chamber 419 may firstremove wafers from the source modules 401 to loadlocks 421. A wafertransfer device (generally a robot arm unit) in the transfer module 403moves the wafers from loadlocks 421 to and among the modules mounted onthe transfer module 403.

In various embodiments, a system controller 429 is employed to controlprocess conditions during deposition. The controller 429 will typicallyinclude one or more memory devices and one or more processors. Aprocessor may include a CPU or computer, analog and/or digitalinput/output connections, stepper motor controller boards, etc.

The controller 429 may control all of the activities of the depositionapparatus. The system controller 429 executes system control software,including sets of instructions for controlling the timing, mixture ofgases, chamber pressure, chamber temperature, wafer temperature, radiofrequency (RF) power levels, wafer chuck or pedestal position, and otherparameters of a particular process. Other computer programs stored onmemory devices associated with the controller 429 may be employed insome embodiments.

Typically there will be a user interface associated with the controller429. The user interface may include a display screen, graphical softwaredisplays of the apparatus and/or process conditions, and user inputdevices such as pointing devices, keyboards, touch screens, microphones,etc.

System control logic may be configured in any suitable way. In general,the logic can be designed or configured in hardware and/or software. Theinstructions for controlling the drive circuitry may be hard coded orprovided as software. The instructions may be provided by “programming.”Such programming is understood to include logic of any form, includinghard coded logic in digital signal processors, application-specificintegrated circuits, and other devices which have specific algorithmsimplemented as hardware. Programming is also understood to includesoftware or firmware instructions that may be executed on a generalpurpose processor. System control software may be coded in any suitablecomputer readable programming language.

The computer program code for controlling the germanium-containingreducing agent pulses, hydrogen flow, and tungsten-containing precursorpulses, and other processes in a process sequence can be written in anyconventional computer readable programming language: for example,assembly language, C, C++, Pascal, Fortran, or others. Compiled objectcode or script is executed by the processor to perform the tasksidentified in the program. Also as indicated, the program code may behard coded.

The controller parameters relate to process conditions, such as, forexample, process gas composition and flow rates, temperature, pressure,cooling gas pressure, substrate temperature, and chamber walltemperature. These parameters are provided to the user in the form of arecipe, and may be entered utilizing the user interface.

Signals for monitoring the process may be provided by analog and/ordigital input connections of the system controller 429. The signals forcontrolling the process are output on the analog and digital outputconnections of the deposition apparatus 400.

The system software may be designed or configured in many differentways. For example, various chamber component subroutines or controlobjects may be written to control operation of the chamber componentsnecessary to carry out the deposition processes in accordance with thedisclosed embodiments. Examples of programs or sections of programs forthis purpose include substrate positioning code, process gas controlcode, pressure control code, and heater control code.

In some implementations, a controller 429 is part of a system, which maybe part of the above-described examples. Such systems can includesemiconductor processing equipment, including a processing tool ortools, chamber or chambers, a platform or platforms for processing,and/or specific processing components (a wafer pedestal, a gas flowsystem, etc.). These systems may be integrated with electronics forcontrolling their operation before, during, and after processing of asemiconductor wafer or substrate. The electronics may be referred to asthe “controller,” which may control various components or subparts ofthe system or systems. The controller 429, depending on the processingrequirements and/or the type of system, may be programmed to control anyof the processes disclosed herein, including the delivery of processinggases, temperature settings (e.g., heating and/or cooling), pressuresettings, vacuum settings, power settings, radio frequency (RF)generator settings in some systems, RF matching circuit settings,frequency settings, flow rate settings, fluid delivery settings,positional and operation settings, wafer transfers into and out of atool and other transfer tools and/or load locks connected to orinterfaced with a specific system.

Broadly speaking, the controller may be defined as electronics havingvarious integrated circuits, logic, memory, and/or software that receiveinstructions, issue instructions, control operation, enable cleaningoperations, enable endpoint measurements, and the like. The integratedcircuits may include chips in the form of firmware that store programinstructions, digital signal processors (DSPs), chips defined asapplication specific integrated circuits (ASICs), and/or one or moremicroprocessors, or microcontrollers that execute program instructions(e.g., software). Program instructions may be instructions communicatedto the controller in the form of various individual settings (or programfiles), defining operational parameters for carrying out a particularprocess on or for a semiconductor wafer or to a system. The operationalparameters may, in some embodiments, be part of a recipe defined byprocess engineers to accomplish one or more processing steps during thefabrication of one or more layers, materials, metals, oxides, silicon,silicon dioxide, surfaces, circuits, and/or dies of a wafer.

The controller 429, in some implementations, may be a part of or coupledto a computer that is integrated with, coupled to the system, otherwisenetworked to the system, or a combination thereof. For example, thecontroller 429 may be in the “cloud” or all or a part of a fab hostcomputer system, which can allow for remote access of the waferprocessing. The computer may enable remote access to the system tomonitor current progress of fabrication operations, examine a history ofpast fabrication operations, examine trends or performance metrics froma plurality of fabrication operations, to change parameters of currentprocessing, to set processing steps to follow a current processing, orto start a new process. In some examples, a remote computer (e.g. aserver) can provide process recipes to a system over a network, whichmay include a local network or the Internet. The remote computer mayinclude a user interface that enables entry or programming of parametersand/or settings, which are then communicated to the system from theremote computer. In some examples, the controller receives instructionsin the form of data, which specify parameters for each of the processingsteps to be performed during one or more operations. It should beunderstood that the parameters may be specific to the type of process tobe performed and the type of tool that the controller is configured tointerface with or control. Thus as described above, the controller maybe distributed, such as by including one or more discrete controllersthat are networked together and working towards a common purpose, suchas the processes and controls described herein. An example of adistributed controller for such purposes would be one or more integratedcircuits on a chamber in communication with one or more integratedcircuits located remotely (such as at the platform level or as part of aremote computer) that combine to control a process on the chamber.

Without limitation, example systems may include a plasma etch chamber ormodule, a deposition chamber or module, a spin-rinse chamber or module,a metal plating chamber or module, a clean chamber or module, a beveledge etch chamber or module, a physical vapor deposition (PVD) chamberor module, a CVD chamber or module, an ALD chamber or module, an atomiclayer etch (ALE) chamber or module, an ion implantation chamber ormodule, a track chamber or module, and any other semiconductorprocessing systems that may be associated or used in the fabricationand/or manufacturing of semiconductor wafers.

As noted above, depending on the process step or steps to be performedby the tool, the controller might communicate with one or more of othertool circuits or modules, other tool components, cluster tools, othertool interfaces, adjacent tools, neighboring tools, tools locatedthroughout a factory, a main computer, another controller, or tools usedin material transport that bring containers of wafers to and from toollocations and/or load ports in a semiconductor manufacturing factory.

The controller 429 may include various programs. A substrate positioningprogram may include program code for controlling chamber components thatare used to load the substrate onto a pedestal or chuck and to controlthe spacing between the substrate and other parts of the chamber such asa gas inlet and/or target. A process gas control program may includecode for controlling gas composition, flow rates, pulse times, andoptionally for flowing gas into the chamber prior to deposition in orderto stabilize the pressure in the chamber. A pressure control program mayinclude code for controlling the pressure in the chamber by regulating,e.g., a throttle valve in the exhaust system of the chamber. A heatercontrol program may include code for controlling the current to aheating unit that is used to heat the substrate. Alternatively, theheater control program may control delivery of a heat transfer gas suchas helium to the wafer chuck.

Examples of chamber sensors that may be monitored during depositioninclude mass flow controllers, pressure sensors such as manometers, andthermocouples located in the pedestal or chuck. Appropriately programmedfeedback and control algorithms may be used with data from these sensorsto maintain desired process conditions.

The foregoing describes implementation of disclosed embodiments in asingle or multi-chamber semiconductor processing tool. The apparatus andprocess described herein may be used in conjunction with lithographicpatterning tools or processes, for example, for the fabrication ormanufacture of semiconductor devices, displays, LEDs, photovoltaicpanels, and the like. Typically, though not necessarily, suchtools/processes will be used or conducted together in a commonfabrication facility. Lithographic patterning of a film typicallyincludes some or all of the following steps, each step provided with anumber of possible tools: (1) application of photoresist on a workpiece,i.e., substrate, using a spin-on or spray-on tool; (2) curing ofphotoresist using a hot plate or furnace or UV curing tool; (3) exposingthe photoresist to visible or UV or x-ray light with a tool such as awafer stepper; (4) developing the resist so as to selectively removeresist and thereby pattern it using a tool such as a wet bench; (5)transferring the resist pattern into an underlying film or workpiece byusing a dry or plasma-assisted etching tool; and (6) removing the resistusing a tool such as an RF or microwave plasma resist stripper.

EXPERIMENTAL Experiment 1

An experiment was conducted on four substrates and the thickness of thetungsten deposited on each substrate was measured. The results are shownin FIG. 6.

The first substrate was exposed to alternating pulses of SiH₄ andWCl_(x) until a tungsten nucleation layer was deposited to a thicknessof 30 Å at a chamber pressure of 5 Torr and a substrate temperature of450° C. using 5% SiH₄ and 85% H₂ during the SIH₄ pulse, and 0.5% WCl_(x)precursor in argon during the WCl_(x) pulse. The substrate was thenexposed to alternating pulses of H₂ and WCl_(x) to deposit bulk tungstenat a chamber pressure of 5 Torr and a substrate temperature of 525° C.using >90% H₂ during the H₂ pulse and 0.7% tungsten precursor in argonduring the WCl_(x) pulse. The thickness is represented by plots 601B andtrend line 601A.

The second substrate was exposed to alternating pulses of SiH₄ andWCl_(x) until a tungsten nucleation layer was deposited to a thicknessof 10 Å at a chamber pressure of 5 Torr and a substrate temperature of450° C. using 5% SiH₄ and 85% H₂ during the SIH₄ pulse, and 0.5% WCl_(x)precursor in argon during the WCl_(x) pulse. The substrate was thenexposed to alternating pulses of H₂ and WCl_(x) to deposit bulk tungstenat a chamber pressure of 5 Torr and a substrate temperature of 525° C.using >90% H₂ during the H₂ pulse and 0.7% tungsten precursor in argonduring the WCl_(x) pulse. The thickness is represented by plots 603B andtrend line 603A.

The third substrate was sputtered with tungsten using PVD and thenexposed to alternating pulses of H₂ and WCl_(x) to deposit bulk tungstenat a chamber pressure of 5 Torr and a substrate temperature of 525° C.using >90% H₂ during the H₂ pulse and 0.7% tungsten precursor in argonduring the WCl_(x) pulse. The thickness is represented by plots 605B andtrend line 605A.

The fourth substrate having a TiN surface was exposed to alternatingpulses of H₂ and WCl_(x) to deposit bulk tungsten without treatment andwithout depositing a nucleation layer at a chamber pressure of 5 Torrand a substrate temperature of 525° C. using >90% H₂ during the H₂ pulseand 0.7% tungsten precursor in argon during the WCl_(x) pulse. Thethickness is represented by plots 607B and trend line 607A.

A growth rate of zero is typical and expected for forming tungsten onTiN without nucleation using alternating pulses of H₂ and WF₆ and thus,such deposition using H₂ and WF₆ usually involve deposition of atungsten nucleation layer or pre-soak operation using B₂H₆ to growtungsten. Surprisingly, the results in FIG. 6 suggest that tungstengrowth rate is substrate and nucleation independent with exposing thesubstrate to alternating pulses of H₂ and WCl_(x) without soak ornucleation layer deposition.

Experiment 2

An experiment was conducted on four substrates and the resistivity ofthe tungsten deposited on each substrate was measured at variousthicknesses. The results are shown in FIG. 7.

The first substrate was exposed to 3 cycles of alternating pulses ofSiH₄ and WF₆ and 3 cycles of alternating pulses of B₂H₆ and WF₆ until atungsten nucleation layer was deposited to a thickness of 20 Å.Subsequently, bulk tungsten was deposited over the tungsten nucleationlayer by exposing the nucleation layer to alternating pulses of H₂ andWCl_(x) to deposit bulk tungsten at a chamber pressure of 5 Torr and asubstrate temperature of 525° C. using >90% H₂ during the H₂ pulse and0.7% tungsten precursor in argon during the WCl_(x) pulse. Theresistivity was measured at various thicknesses of the depositedtungsten and is depicted in FIG. 7 as 701.

The second substrate having a TiN surface was exposed to alternatingpulses of H₂ and WCl_(x) to deposit bulk tungsten without treatment andwithout depositing a nucleation layer at a chamber pressure of 5 Torrand a substrate temperature of 525° C. using >90% H₂ during the H₂ pulseand 0.7% tungsten precursor in argon during the WCl_(x) pulse. Theresistivity was measured at various thicknesses of the depositedtungsten and is depicted in FIG. 7 as 703.

The third substrate was exposed to alternating pulses of SiH₄ andWCl_(x) until a tungsten nucleation layer was deposited to a thicknessof 30 Å at a chamber pressure of 5 Torr and a substrate temperature of450° C. using 5% SiH₄ and 85% H₂ during the SIH₄ pulse, and 0.5% WCl_(x)precursor in argon during the WCl_(x) pulse. The substrate was thenexposed to alternating pulses of H₂ and WCl_(x) to deposit bulk tungstenat a chamber pressure of 5 Torr and a substrate temperature of 525° C.using >90% H₂ during the H₂ pulse and 0.7% tungsten precursor in argonduring the WCl_(x) pulse. The resistivity was measured at variousthicknesses of the deposited tungsten and is depicted in FIG. 7 as 704.

The fourth substrate was exposed to alternating pulses of SiH₄ andWCl_(x) until a tungsten nucleation layer was deposited to a thicknessof 10 Å at a chamber pressure of 5 Torr and a substrate temperature of450° C. using 5% SiH₄ and 85% H₂ during the SIH₄ pulse, and 0.5% WCl_(x)precursor in argon during the WCl_(x) pulse. The substrate was thenexposed to alternating pulses of H₂ and WCl_(x) to deposit bulk tungstenat a chamber pressure of 5 Torr and a substrate temperature of 525° C.using >90% H₂ during the H₂ pulse and 0.7% tungsten precursor in argonduring the WCl_(x) pulse. The resistivity was measured at variousthicknesses of the deposited tungsten and is depicted in FIG. 7 as 705.

These results indicate that presence of a nucleation layer and the typeof substrate that is exposed to the alternating pulses of H₂ and WCl_(x)strongly affects the resistivity of the tungsten film. For example, forless than 50 Å of deposited tungsten, films deposited using nonucleation (704) and thin nucleation (30A) deposited using WCl_(x) hadlower resistivity. This may be due to a grain growth template effect(that is, the surface upon which the tungsten is being deposited affectsthe size of grains grown on the substrate). For resistivity of filmsmeasured at a thickness of greater than 50 Å, films having no nucleationor little nucleation deposited by WCl_(x), followed by alternatingpulses of WCl_(x) and H₂ (shown in 703, 704, and 705) have higherresistivity, which may be due to tungsten crystal size template effect.The lowest resistivity for thicknesses greater than 50 Å as shown inFIG. 7 was found in films deposited using WF₆ and reducing agents fornucleation layer, followed by alternating pulses of WCl_(x) and H₂,possibly due to the nucleation layer deposition creating favorablegrowth templates to generate large tungsten crystals. At lowerthicknesses (<50 Å), however, the resistivity is much higher than theother substrates. These results suggest that the deposition processusing alternating pulses of WCl_(x) and a reducing agent can bemodulated to promote large tungsten grain size growth. In some cases, itmay be suitable to use a nucleation layer using B₂H₆ and/or SiH₄ andWCl_(x) prior to depositing using alternating pulses of WCl_(x) and H₂.However, these results also indicate that deposition without anynucleation layer, which can promote efficiency and increased throughput,also yield comparable results suitable for use in depositing bulktungsten directly on a substrate.

CONCLUSION

Although the foregoing embodiments have been described in some detailfor purposes of clarity of understanding, it will be apparent thatcertain changes and modifications may be practiced within the scope ofthe appended claims. It should be noted that there are many alternativeways of implementing the processes, systems, and apparatus of thepresent embodiments. Accordingly, the present embodiments are to beconsidered as illustrative and not restrictive, and the embodiments arenot to be limited to the details given herein.

What is claimed is:
 1. A method of filling a feature comprising: (a)providing a substrate in a chamber, the substrate comprising the featurehaving an untreated surface; and (b) without treating the untreatedsurface of the feature and without depositing a tungsten nucleationlayer in the feature, exposing the untreated surface to cycles ofalternating pulses of hydrogen and a chlorine-containing tungstenprecursor introduced to the chamber to deposit bulk tungsten directly onthe untreated surface.
 2. The method of claim 1, wherein thechlorine-containing tungsten precursor is tungsten hexachloride.
 3. Themethod of claim 1, wherein the chlorine-containing tungsten precursor istungsten pentachloride.
 4. The method of claim 1, wherein a pulse of thechlorine-containing tungsten precursor comprises between about 0.1% andabout 1.5% of chlorine-containing tungsten precursor by volume.
 5. Themethod of claim 1, wherein the chamber is purged between each pulse ofthe hydrogen and the chlorine-containing tungsten precursor.
 6. A methodof filling a feature comprising: (a) providing a substrate in a chamber,the substrate comprising the feature; and (b) exposing the substrate tocycles of alternating pulses of hydrogen and a chlorine-containingtungsten precursor introduced to the chamber to deposit bulk tungstendirectly in the feature, wherein the chamber pressure is no more than 10Torr.
 7. The method of claim 6, further comprising, (c) prior toexposing the substrate to the alternating pulses of the hydrogen and thechlorine-containing tungsten precursor, exposing the substrate to areducing agent for a soak treatment.
 8. The method of claim 6, furthercomprising, (c) prior to exposing the substrate to the alternatingpulses of the hydrogen and the chlorine-containing tungsten precursor,exposing the substrate to alternating pulses of a reducing agent and thechlorine-containing tungsten precursor to deposit a tungsten nucleationlayer on the substrate.
 9. The method of claim 6, wherein each cycleforms a submonolayer of the bulk tungsten having a thickness of at leastabout 0.3 Å.
 10. The method of claim 6, wherein the chlorine-containingtungsten precursor is tungsten hexachloride.
 11. The method of claim 6,wherein the chlorine-containing tungsten precursor is tungstenpentachloride.
 12. The method of claim 6, wherein the bulk tungsten isdeposited at a substrate temperature between about 400° C. and about600° C.
 13. The method of claim 6, wherein the chamber is purged betweeneach pulse of the hydrogen and the chlorine-containing tungstenprecursor.
 14. The method of claim 6, wherein each purge is performedfor a duration between about 0.25 seconds and about 30 seconds.
 15. Themethod of claim 6, wherein a pulse of the chlorine-containing tungstenprecursor comprises between about 0.1% and about 1.5% ofchlorine-containing tungsten precursor by volume.
 16. A method offilling a feature comprising: (a) providing a substrate in a chamber,the substrate comprising the feature; (b) exposing the substrate tocycles of alternating pulses of hydrogen and a chlorine-containingtungsten precursor introduced to the chamber to deposit bulk tungsten inthe feature without depositing a tungsten nucleation layer; and (c)prior to exposing the substrate to the alternating pulses of thehydrogen and the chlorine-containing tungsten precursor, exposing thesubstrate to a reducing agent for a soak treatment.
 17. The method ofclaim 16, wherein a pulse of the chlorine-containing tungsten precursorcomprises between about 0.1% and about 1.5% of chlorine-containingtungsten precursor by volume.
 18. The method of claim 16, wherein thebulk tungsten is deposited at a substrate temperature between about 400°C. and about 600° C.
 19. The method of claim 16, wherein the chamber ispurged between each pulse of the reducing agent and thechlorine-containing tungsten precursor.
 20. The method of claim 16,wherein each purge is performed for a duration between about 0.25seconds and about 30 seconds.